"Estimation of Optimum Ion Energy for the Reduction of Resistivity in Bias ..."

Kiyoshi Ishii et al. (2008)

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DOI: 10.1093/IETELE/E91-C.10.1653

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type: Journal Article

metadata version: 2020-04-11

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Kiyoshi Ishii, Yoshifumi Saitou, Kengo Furutani, Hiroshi Sakuma, Yoshito Ikeda:
Estimation of Optimum Ion Energy for the Reduction of Resistivity in Bias Sputtering of ITO Thin Films. IEICE Trans. Electron. 91-C(10): 1653-1657 (2008)

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