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"High-Rate Oblique Deposition of SiO2 Films Using Two Sputtering ..."
Yoichi Hoshi et al. (2008)
- Yoichi Hoshi, Kensuke Yagi, Eisuke Suzuki, Hao Lei, Akira Sakai:
High-Rate Oblique Deposition of SiO2 Films Using Two Sputtering Sources. IEICE Trans. Electron. 91-C(10): 1644-1648 (2008)
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