"Low-Temperature Activation in Boron Ion-Implanted Silicon by Soft X-Ray ..."

Akira Heya, Naoto Matsuo, Kazuhiro Kanda (2016)

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DOI: 10.1587/TRANSELE.E99.C.474

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type: Journal Article

metadata version: 2024-10-06

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Akira Heya, Naoto Matsuo, Kazuhiro Kanda:
Low-Temperature Activation in Boron Ion-Implanted Silicon by Soft X-Ray Irradiation. IEICE Trans. Electron. 99-C(4): 474-480 (2016)

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