"Fabrication of tunneling dielectric thin-film transistor with very thin ..."

Naoto Matsuo et al. (2007)

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DOI: 10.1587/ELEX.4.442

access: open

type: Journal Article

metadata version: 2024-10-06

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Naoto Matsuo, Atsushi Fukushima, Kensaku Ohkura, Akira Heya, Shin Yokoyama:
Fabrication of tunneling dielectric thin-film transistor with very thin SiN_x films onto source and drain. IEICE Electron. Express 4(14): 442-447 (2007)

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