"Impact of Si surface roughness on MOSFET characteristics with ultrathin ..."

Dae-Hee Han, Huiseong Han, Shun'ichiro Ohmi (2013)

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DOI: 10.1587/ELEX.10.20130651

access: open

type: Journal Article

metadata version: 2021-02-12

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  - https://dblp.org/rec/journals/ieiceee/HanHO13
Dae-Hee Han, Huiseong Han, Shun'ichiro Ohmi:
Impact of Si surface roughness on MOSFET characteristics with ultrathin HfON gate insulator formed by ECR plasma sputtering. IEICE Electron. Express 10(18): 20130651 (2013)

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