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"Evaluation of Al(Nd)-alloy films for application to thin-film-transistor ..."

Hiroshi Takatsuji et al. (1998)

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DOI: 10.1147/RD.423.0501

access: closed

type: Journal Article

metadata version: 2020-03-13

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  - journals/ibmrd/TakatsujiCCH98
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  - https://dblp.org/rec/journals/ibmrd/TakatsujiCCH98
Hiroshi Takatsuji, Evan G. Colgan, Cyril Cabral Jr., James M. E. Harper:
Evaluation of Al(Nd)-alloy films for application to thin-film-transistor liquid crystal displays. IBM J. Res. Dev. 42(3): 501-508 (1998)

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