"Plasma processing in the fabrication of amorphous silicon ..."

Yue Kuo, Kenji Okajima, Masatomo Takeichi (1999)

> Home

Details and statistics

DOI: 10.1147/RD.431.0073

access: closed

type: Journal Article

metadata version: 2020-03-13

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/ibmrd/KuoOT99
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/ibmrd/KuoOT99
Yue Kuo, Kenji Okajima, Masatomo Takeichi:
Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays. IBM J. Res. Dev. 43(1): 73-88 (1999)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.