"Advanced DUV photolithography in a pilot lineenvironment."

Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire (1997)

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DOI: 10.1147/RD.411.0021

access: closed

type: Journal Article

metadata version: 2020-03-13

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Christopher P. Ausschnitt, Allan C. Thomas, Timothy J. Wiltshire:
Advanced DUV photolithography in a pilot lineenvironment. IBM J. Res. Dev. 41(1&2): 21-38 (1997)

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