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"Continuous MOSFET performance increase with device scaling: The role of ..."
Dimitri A. Antoniadis et al. (2006)
- Dimitri A. Antoniadis, Ingvar Åberg, Cáit Ní Chléirigh, Osama M. Nayfeh, Ali Khaki-Firooz, Judy L. Hoyt:
Continuous MOSFET performance increase with device scaling: The role of strain and channel material innovations. IBM J. Res. Dev. 50(4-5): 363-376 (2006)
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