"Next-generation virtual metrology for semiconductor manufacturing: A ..."

Kerul Suthar et al. (2019)

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DOI: 10.1016/J.COMPCHEMENG.2019.05.016

access: closed

type: Journal Article

metadata version: 2023-09-30

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Kerul Suthar, Devarshi Shah, Jin Wang, Q. Peter He:
Next-generation virtual metrology for semiconductor manufacturing: A feature-based framework. Comput. Chem. Eng. 127: 140-149 (2019)

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