"Optimal control of the wafer temperatures in diffusion/LPCVD reactors."

H. De Waard, Willem L. De Koning (1992)

> Home

Details and statistics

DOI: 10.1016/0005-1098(92)90112-S

access: closed

type: Journal Article

metadata version: 2020-02-20

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/automatica/WaardK92
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/automatica/WaardK92
H. De Waard, Willem L. De Koning:
Optimal control of the wafer temperatures in diffusion/LPCVD reactors. Autom. 28(2): 243-253 (1992)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.