"Effect of Al Concentration on Ferroelectric Properties in ..."

Jihyung Kim et al. (2023)

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DOI: 10.1002/AISY.202370036

access: open

type: Journal Article

metadata version: 2023-10-14

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  - https://dblp.org/rec/journals/aisy/KimKMKHK23
Jihyung Kim, Dahye Kim, Kyung Kyu Min, Matthias Kraatz, Taeyoung Han, Sungjun Kim:
Effect of Al Concentration on Ferroelectric Properties in HfAlO_x-Based Ferroelectric Tunnel Junction Devices for Neuroinspired Applications. Adv. Intell. Syst. 5(8) (2023)

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