"Process-Dependent Evolution of Channel Stress and Stress-Induced Mobility ..."

Chiang Zhu et al. (2025)

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DOI: 10.1109/ACCESS.2025.3534280

access: open

type: Journal Article

metadata version: 2025-03-07

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Chiang Zhu, Xiaona Zhu, Shaofeng Yu, David Wei Zhang:
Process-Dependent Evolution of Channel Stress and Stress-Induced Mobility Gain in FinFET, Normal GAAFET, and Si/SiGe Hybrid Channel GAAFET. IEEE Access 13: 21600-21609 (2025)

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