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"Study on Degradation of SF6 in the Presence of H2O ..."
Xiaoxing Zhang et al. (2018)
- Xiaoxing Zhang, Zhaolun Cui, Yalong Li, Hanyan Xiao, Yi Li, Ju Tang:
Study on Degradation of SF6 in the Presence of H2O and O2 Using Dielectric Barrier Discharge. IEEE Access 6: 72748-72756 (2018)
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