"O2 Plasma Alternately Treated ALD-Al2O3 ..."

Qiang Wang et al. (2024)

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DOI: 10.1109/ACCESS.2023.3347810

access: open

type: Journal Article

metadata version: 2024-02-29

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Qiang Wang, Maolin Pan, Penghao Zhang, Luyu Wang, Yannan Yang, Xinling Xie, Hai Huang, Xin Hu, Min Xu:
O₂ Plasma Alternately Treated ALD-Al₂O₃ as Gate Dielectric for High Performance AlGaN/GaN MIS-HEMTs. IEEE Access 12: 16089-16094 (2024)

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