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"An Active Resistor With a Lower Sensitivity to Process Variations, and its ..."

Vilem Kledrowetz et al. (2020)

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DOI: 10.1109/ACCESS.2020.3034790

access: open

type: Journal Article

metadata version: 2020-12-31

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  - https://dblp.org/rec/journals/access/KledrowetzHPF20
Vilem Kledrowetz, Jiri Haze, Roman Prokop, Lukas Fujcik:
An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference. IEEE Access 8: 197263-197275 (2020)

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