"Validation and Verification of the Simulation Model of a Photolithography ..."

Nirupama Nayani, Mansooreh Mollaghasemi (1998)

> Home

Details and statistics

DOI: 10.1109/WSC.1998.745835

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-24

- view
  authority control:
- export record
  dblp key:
  - conf/wsc/NayaniM98
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/wsc/NayaniM98
Nirupama Nayani, Mansooreh Mollaghasemi:
Validation and Verification of the Simulation Model of a Photolithography Process in Semiconductor Manufacturing. WSC 1998: 1017-1022

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.