"Scaled contact length with low contact resistance in monolayer 2D channel ..."

Wen-Chia Wu et al. (2023)

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DOI: 10.23919/VLSITECHNOLOGYANDCIR57934.2023.10185408

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-06

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Wen-Chia Wu, Terry Y. T. Hung, D. Mahaveer Sathaiya, Dongxu Fan, Goutham Arutchelvan, Chen-Feng Hsu, Sheng-Kai Su, Ang-Sheng Chou, Edward Chen, Weisheng Li, Zhihao Yu, Hao Qiu, Ying-Mei Yang, Kuang-I Lin, Yun-Yang Shen, Wen-Hao Chang, San Lin Liew, Vincent D.-H. Hou, Jin Cai, Chung-Cheng Wu, Jeff Wu, H.-S. Philip Wong, Xinran Wang, Chao-Hsin Chien, Chao-Ching Cheng, Iuliana P. Radu:
Scaled contact length with low contact resistance in monolayer 2D channel transistors. VLSI Technology and Circuits 2023: 1-2

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