"Record Transconductance in Leff~30 nm Self-Aligned Replacement Gate ETSOI ..."

Li-Chen Wang et al. (2023)

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DOI: 10.23919/VLSITECHNOLOGYANDCIR57934.2023.10185436

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type: Conference or Workshop Paper

metadata version: 2023-09-28

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Li-Chen Wang, W. Li, Nirmaan Shanker, Suraj S. Cheema, Shang-Lin Hsu, S. Volkman, U. Sikder, C. Garg, J.-H. Park, Y.-H. Liao, Yen-Kai Lin, Chenming Hu, Sayeef S. Salahuddin:
Record Transconductance in Leff~30 nm Self-Aligned Replacement Gate ETSOI nFETs Using Low EOT Negative Capacitance HfO2-ZrO2 Superlattice Gate Stack. VLSI Technology and Circuits 2023: 1-2

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