"4F2 Stackable Polysilicon Channel Access Device for Ultra-Dense ..."

A. Liao et al. (2024)

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DOI: 10.1109/VLSITECHNOLOGYANDCIR46783.2024.10631429

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type: Conference or Workshop Paper

metadata version: 2024-10-17

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A. Liao, M. Jerry, K. Karda, Matthew Hollander, P. Sharma, R. Ge, T. Zhao, G. K. El Hajjam, M. Mariani, M. Calabrese, D. Raimondi, A. Rigano, T. Rossi, K. Florent, N. Tapias, C. Jacob, Alessandro Calderoni, S. Chhajed, J. Zahurak, Nirmal Ramaswamy:
4F² Stackable Polysilicon Channel Access Device for Ultra-Dense NVDRAM. VLSI Technology and Circuits 2024: 1-3

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