"In-depth Analysis of the Hafnia Ferroelectrics as a Key Enabler for Low ..."

Giuk Kim et al. (2024)

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DOI: 10.1109/VLSITECHNOLOGYANDCIR46783.2024.10631559

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-17

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Giuk Kim, Hyojun Choi, Hunbeom Shin, Sangho Lee, Sangmok Lee, Yunseok Nam, Minhyun Jung, Ilho Myeong, Kijoon Kim, Jongho Woo, Suhwan Lim, Kwangsoo Kim, Wanki Kim, Daewon Ha, Jinho Ahn, Sanghun Jeon:
In-depth Analysis of the Hafnia Ferroelectrics as a Key Enabler for Low Voltage & QLC 3D VNAND Beyond 1K Layers: Experimental Demonstration and Modeling. VLSI Technology and Circuits 2024: 1-2

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