"Positive Bias Stress Measurement Guideline and Band Analysis for ..."

Qi Jiang et al. (2024)

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DOI: 10.1109/VLSITECHNOLOGYANDCIR46783.2024.10631369

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type: Conference or Workshop Paper

metadata version: 2024-10-17

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Qi Jiang, Koustav Jana, Kasidit Toprasertpong, Shuhan Liu, H.-S. Philip Wong:
Positive Bias Stress Measurement Guideline and Band Analysis for Evaluating Instability of Oxide Semiconductor Transistors. VLSI Technology and Circuits 2024: 1-2

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