"Scaling Potential of Nanosheet Oxide Semiconductor FETs for Monolithic 3D ..."

Kaito Hikake et al. (2024)

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DOI: 10.1109/VLSITECHNOLOGYANDCIR46783.2024.10631493

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type: Conference or Workshop Paper

metadata version: 2024-10-17

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Kaito Hikake, Xingyu Huang, Sung-Hun Kim, Kota Sakai, Zhuo Li, Tomoko Mizutani, Takuya Saraya, Toshiro Hiramoto, Takanori Takahashi, Mutsunori Uenuma, Yukiharu Uraoka, Masaharu Kobayashi:
Scaling Potential of Nanosheet Oxide Semiconductor FETs for Monolithic 3D Integration-ALD Material Engineering, High-Field Transport, Statistical Variability. VLSI Technology and Circuits 2024: 1-2

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