"Comprehensive Analysis of Duty-Cycle Induced Degradations in ..."

Guan Feng et al. (2024)

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DOI: 10.1109/VLSITECHNOLOGYANDCIR46783.2024.10631494

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type: Conference or Workshop Paper

metadata version: 2024-10-17

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Guan Feng, Yu Li, Hao Jiang, Xiaodong Wang, Yize Sun, Yingfen Wei, Qi Liu, Ming Liu:
Comprehensive Analysis of Duty-Cycle Induced Degradations in HfxZr1-xO2-Based Ferroelectric Capacitors: Behavior, Modeling, and Optimization. VLSI Technology and Circuits 2024: 1-2

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