"Interfacial-Layer Design for Hf1-xZrxO2-Based FTJ Devices: From Atom to Array."

H.-L. Chiang et al. (2022)

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DOI: 10.1109/VLSITECHNOLOGYANDCIR46769.2022.9830462

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-06

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H.-L. Chiang, J.-F. Wang, K.-H. Lin, C.-H. Nien, J.-J. Wu, Kuo-Yu Hsiang, C.-P. Chuu, Y.-W. Chen, X. W. Zhang, C. W. Liu, Tahui Wang, C. C. Wang, Min-Hung Lee, M.-F. Chang, C.-S. Chang, T. C. Chen:
Interfacial-Layer Design for Hf1-xZrxO2-Based FTJ Devices: From Atom to Array. VLSI Technology and Circuits 2022: 361-362

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