"Vt Fine-Tuning in Multi-Vt Gate-All-Around Nanosheet nFETs Using ..."

Hiroaki Arimura et al. (2024)

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DOI: 10.1109/VLSITECHNOLOGYANDCIR46783.2024.10631442

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type: Conference or Workshop Paper

metadata version: 2024-10-17

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Hiroaki Arimura, Hans Mertens, Jacopo Franco, L. Lukose, W. Maqsood, S. Brus, Thomas Chiarella, A. Impagnatiello, S. Homkar, V. K. Mootheri, C. Yin, G. Alessio Verni, M. Givens, L. Petersen Barbosa Lima, S. Biesemans, N. Horiguchi:
Vt Fine-Tuning in Multi-Vt Gate-All-Around Nanosheet nFETs Using Rare-Earth Oxide-Based Dipole-First Gate Stack Compatible with CFET Integration. VLSI Technology and Circuits 2024: 1-2

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