"Optimization of the Deposition Condition for Improving the Ti Film ..."

Yun-Wei Lin, Chia-Ming Lin (2020)

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DOI: 10.1007/978-3-030-69514-9_40

access: closed

type: Conference or Workshop Paper

metadata version: 2023-01-12

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Yun-Wei Lin, Chia-Ming Lin:
Optimization of the Deposition Condition for Improving the Ti Film Resistance of DRAM Products. SGIoT 2020: 527-542

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