"Optimized Polarization and Reduced Imprint: Integrating Ferroelectric ..."

David Lehninger et al. (2024)

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DOI: 10.1109/IEEECONF63530.2024.10830822

access: closed

type: Conference or Workshop Paper

metadata version: 2025-01-30

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David Lehninger, Ayse Sünbül, Kerstin Bernert, Hannes Mähne, Shouzhuo Yang, Thomas Kämpfe, Justine Barbot, Steffen Thiem, Konrad Seidel, Maximilian Lederer:
Optimized Polarization and Reduced Imprint: Integrating Ferroelectric Aluminum Co-Doped (Hf, Zr)O2 Films and Superlattices into the BEoL for FeMFET and FRAM Application. NVMTS 2024: 1-5

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