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"Fabrication of ultra-deep high-aspect-ratio isolation trench without void ..."

Liang Qian et al. (2010)

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DOI: 10.1109/NEMS.2010.5592490

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-17

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  dblp key:
  - conf/nems/QianWYY10
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Liang Qian, Jia Wang, Zhenchuan Yang, Guizhen Yan:
Fabrication of ultra-deep high-aspect-ratio isolation trench without void and its application. NEMS 2010: 654-657

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