"A study of thermoplastic properties of a novel photoresist."

Kevin Lou et al. (2015)

> Home

Details and statistics

DOI: 10.1109/NEMS.2015.7147382

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-17

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/nems/LouSYL15
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/nems/LouSYL15
Kevin Lou, Gene Sheu, Shao-Ming Yang, Pradhana Jati Budhi Laksana:
A study of thermoplastic properties of a novel photoresist. NEMS 2015: 95-98

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.