"Extending a 65nm CMOS process design kit for high total ionizing dose effects."

Aristeidis Nikolaou et al. (2018)

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DOI: 10.1109/MOCAST.2018.8376561

access: closed

type: Conference or Workshop Paper

metadata version: 2021-10-14

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Aristeidis Nikolaou, Matthias Bucher, Nikos Makris, Alexia Papadopoulou, Loukas Chevas, Giulio Borghello, Henri D. Koch, Kostas Kloukinas, Tuomas S. Poikela, Federico Faccio:
Extending a 65nm CMOS process design kit for high total ionizing dose effects. MOCAST 2018: 1-4

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