"Intrinsic Parameter Fluctuation and Process Variation Effect of Vertically ..."

Sekhar Reddy Kola, Yiming Li, Min-Hui Chuang (2023)

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DOI: 10.1109/ISQED57927.2023.10129391

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-01

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Sekhar Reddy Kola, Yiming Li, Min-Hui Chuang:
Intrinsic Parameter Fluctuation and Process Variation Effect of Vertically Stacked Silicon Nanosheet Complementary Field-Effect Transistors. ISQED 2023: 1-8

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