"Layout decomposition for hybrid E-beam and DSA double patterning lithography."

Yunfeng Yang et al. (2017)

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DOI: 10.1109/ISCAS.2017.8050912

access: closed

type: Conference or Workshop Paper

metadata version: 2017-10-07

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Yunfeng Yang, Fan Yang, Wai-Shing Luk, Changhao Yan, Xuan Zeng, Xiangdong Hu:
Layout decomposition for hybrid E-beam and DSA double patterning lithography. ISCAS 2017: 1-4

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