"SiGe Gate-All-around Nanosheet Reliability."

Huimei Zhou et al. (2022)

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DOI: 10.1109/IRPS48227.2022.9764509

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-28

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Huimei Zhou, Miaomiao Wang, Ruqiang Bao, Curtis Durfee, Liqiao Qin, Jingyun Zhang:
SiGe Gate-All-around Nanosheet Reliability. IRPS 2022: 60-1

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