"Lateral profiling of HCI induced damage in ultra-scaled FinFET devices ..."

Miaomiao Wang et al. (2018)

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DOI: 10.1109/IRPS.2018.8353639

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-28

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Miaomiao Wang, Richard G. Southwick, Kangguo Cheng, James H. Stathis:
Lateral profiling of HCI induced damage in ultra-scaled FinFET devices with Id-Vd characteristics. IRPS 2018: 6

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