"BTI Characterization of MBE Si-Capped Ge Gate Stack and Defect Reduction ..."

H. W. Wan et al. (2019)

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DOI: 10.1109/IRPS.2019.8720567

access: closed

type: Conference or Workshop Paper

metadata version: 2019-05-31

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H. W. Wan, Y. J. Hong, Y. T. Cheng, M. Hong:
BTI Characterization of MBE Si-Capped Ge Gate Stack and Defect Reduction via Forming Gas Annealing. IRPS 2019: 1-4

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