"Reliability of Ferroelectric and Antiferroelectric Si: HfO2 materials in ..."

Alison Erlene Viegas et al. (2022)

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DOI: 10.1109/IRPS48227.2022.9764517

access: closed

type: Conference or Workshop Paper

metadata version: 2024-08-02

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Alison Erlene Viegas, Konstantinos Efstathios Falidas, Tarek Nadi Ismail Ali, Kati Kühnel, Raik Hoffmann, Clemens Mart, Malte Czernohorsky, Johannes Heitmann:
Reliability of Ferroelectric and Antiferroelectric Si: HfO2 materials in 3D capacitors by TDDB studies. IRPS 2022: 47-1

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