"Effects of Far-BEOL anneal on the WLR and product reliability ..."

Hyun-Chul Sagong et al. (2018)

> Home

Details and statistics

DOI: 10.1109/IRPS.2018.8353649

access: closed

type: Conference or Workshop Paper

metadata version: 2019-01-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/irps/SagongKCYSHJCPS18
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/irps/SagongKCYSHJCPS18
Hyun-Chul Sagong, Hyunjin Kim, Seungjin Choo, Sungyoung Yoon, Hyewon Shim, Sangsu Ha, Tae-Young Jeong, Minhyeok Choe, Junekyun Park, Sangchul Shin, Sangwoo Pae:
Effects of Far-BEOL anneal on the WLR and product reliability characterization of FinFET process technology. IRPS 2018: 6

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.