"A Systematic Study of HCI Improvement in FinFET with Source/Drain Implant ..."

Rakesh Ranjan et al. (2024)

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DOI: 10.1109/IRPS48228.2024.10529365

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-01

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Rakesh Ranjan, Pavitra R. Perepa, Ki-Don Lee, Ashish Kumar Jha, Kartika C. Sahoo, Kayla N. Sanders, Robert Moeller, Prateek Sharma, Minhyo Kang, Peter Kim, Kwanjae Song, Yongwoo Jeon, Seungho Kim, Hyewon Shim, Shin-Young Chung, Ju Kwang Kim:
A Systematic Study of HCI Improvement in FinFET with Source/Drain Implant and Geometry Modulation. IRPS 2024: 5

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