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"Oxygen vacancy traps in Hi-K/Metal gate technologies and their potential ..."
Chandrasekharan Kothandaraman et al. (2015)
- Chandrasekharan Kothandaraman, X. Chen, Dan Moy, D. Lea
, Sami Rosenblatt, Faraz Khan, Derek Leu, Toshiaki Kirihata, D. Ioannou, Giuseppe La Rosa, J. B. Johnson, Norman Robson, Subramanian S. Iyer:
Oxygen vacancy traps in Hi-K/Metal gate technologies and their potential for embedded memory applications. IRPS 2015: 2
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