"At the Extreme of 3D-NAND Scaling: 25 nm Z-Pitch with 10 nm Word Line Cells."

S. Rachidi et al. (2022)

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DOI: 10.1109/IMW52921.2022.9779303

access: closed

type: Conference or Workshop Paper

metadata version: 2024-08-07

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  - https://dblp.org/rec/conf/imw2/RachidiAVDBKObR22
S. Rachidi, Antonio Arreghini, Devin Verreck, G. L. Donadio, K. Banerjee, K. Katcko, Yusuke Oniki, Geert Van den Bosch, Maarten Rosmeulen:
At the Extreme of 3D-NAND Scaling: 25 nm Z-Pitch with 10 nm Word Line Cells. IMW 2022: 1-4

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