"A Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor ..."

Tung-Ho Lin et al. (2006)

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DOI: 10.1109/ROBOT.2006.1641849

access: closed

type: Conference or Workshop Paper

metadata version: 2019-10-19

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Tung-Ho Lin, Min-Hsiung Hung, Rung-Chuan Lin, Fan-Tien Cheng:
A Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing. ICRA 2006: 1054-1059

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