"Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection."

Imen Chakroun et al. (2020)

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DOI: 10.5220/0008877502730279

access: closed

type: Conference or Workshop Paper

metadata version: 2024-02-29

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Imen Chakroun, Thomas J. Ashby, Sayantan Das, Sandip Halder, Roel Wuyts, Wilfried Verachtert:
Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection. ICPRAM 2020: 273-279

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