"Using neural networks to control the process of plasma etching and deposition."

Gamze Erten et al. (1996)

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DOI: 10.1109/ICNN.1996.549050

access: closed

type: Conference or Workshop Paper

metadata version: 2019-08-23

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  - https://dblp.org/rec/conf/icnn/ErtenGSGA96
Gamze Erten, Ammar B. A. Gharbi, Fathi M. A. Salam, Timothy A. Grotjohn, Jes Asmussen:
Using neural networks to control the process of plasma etching and deposition. ICNN 1996: 1091-1096

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