"Long Is More for Alignment: A Simple but Tough-to-Beat Baseline for ..."

Hao Zhao et al. (2024)

> Home

Details and statistics

DOI: —

access: open

type: Conference or Workshop Paper

metadata version: 2024-09-02

- view
  - electronic edition @ openreview.net (open access)
- export record
  dblp key:
  - conf/icml/ZhaoACF24
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/icml/ZhaoACF24
Hao Zhao, Maksym Andriushchenko, Francesco Croce, Nicolas Flammarion:
Long Is More for Alignment: A Simple but Tough-to-Beat Baseline for Instruction Fine-Tuning. ICML 2024

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.