"Patterning Nanometer Resist Features on Planar and Topography Substrates ..."

Khalil Arshak et al. (2005)

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DOI: 10.1109/ICMENS.2005.97

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-24

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Khalil Arshak, Stephen F. Gilmartin, Damian Collins, Olga Korostynska, Arous Arshak:
Patterning Nanometer Resist Features on Planar and Topography Substrates Using The 2-Step NERIME FIB Top Surface Imaging Process. ICMENS 2005: 159-166

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