"Effect of thermal annealing in H2 atmosphere of SiCxOy films obtained by ..."

Juan Carlos Pérez Trinidad et al. (2023)

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DOI: 10.1109/CCE60043.2023.10332817

access: closed

type: Conference or Workshop Paper

metadata version: 2024-05-07

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Juan Carlos Pérez Trinidad, Marco Antonio Vasquez-Agustin, Godofredo García Salgado, Román Romano-Trujillo, Fernando Lopez-Marcos, Heber Vilchis, Enrique Rosendo Andrés, José Juan Gervacio Arciniega, Orlando Cortazar Martínez, Antonio Coyopol Solís:
Effect of thermal annealing in H2 atmosphere of SiCxOy films obtained by HFCVD technique. CCE 2023: 1-7

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