"Equipment design and process control of critical dimensions in lithography."

Yit Sung Ngo et al. (2010)

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DOI: 10.1109/ICCA.2010.5524378

access: closed

type: Conference or Workshop Paper

metadata version: 2020-10-25

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Yit Sung Ngo, Geng Yang, Andi Sudjana Putra, Kar Tien Ang, Arthur Tay, Zhong Ping Fang:
Equipment design and process control of critical dimensions in lithography. ICCA 2010: 1572-1577

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