"Properties of epitaxial AlN thin film deposited on sapphire substrate by ..."

Satoru Kaneko et al. (2013)

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DOI: 10.1109/ICAIT.2013.6621498

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-06

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Satoru Kaneko, Takeshi Ito, Manabu Yasui, Masahito Kurouchi, Hironori Torii, Takao Amazawa, Takashi Tikumasu, Takatoshi Nagano, Lee Seughwan, Sungkyun Park, Hirofumi Takikawa:
Properties of epitaxial AlN thin film deposited on sapphire substrate by ECR plasma. ICAIT 2013: 69-70

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