"A tool to simulate optical lithography in nanoCMOs."

Tania Mara Ferla, Guilherme Flach, Ricardo Reis (2014)

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DOI: 10.1109/I2MTC.2014.6860989

access: closed

type: Conference or Workshop Paper

metadata version: 2019-10-22

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Tania Mara Ferla, Guilherme Flach, Ricardo Reis:
A tool to simulate optical lithography in nanoCMOs. I2MTC 2014: 1471-1474

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